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Planar Cu Target

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Guangzhou UV Tech Material Ltd
[China]

Address
No.4 of HuaHui Road, Overseas Technology Industry Park, Huashan Town, Huadu District Guangzhou Guangdong
Phone
86-20-13249153016
Contact name
Vicky Chan

Quick Information

  • Brand Name: UVTM
  • Place of Origin: China

Description

Planar Cu Target

1. Application
for copper film, widely used in decorative glass mirror film, PCB
board coating etc.

2. Physical and Chemical Properties
Chemical Composition: Cu
Molding process: Melting
Density: >8.9g/cm3(100%)
Grain size: <50um
Purity: 99.99%
Maximum Impurities content Unit: ppm
Al ≤ 5.6 Cr ≤ 6.8 Fe ≤ 8.8
K ≤ 14.7 Na ≤ 50 Te ≤ 14.9

3. Maximum Machining Size
L1900*W280*T18mm
Multi-assemblies
Customize as per customer specification

Other Information
UVTM Rotatable & Planar sputtering targets, material available:  Ag, SiAl, NbOx, TiOx, MoNb, Cr, Si, Ti, TiAl, Al Alloy, Cu, Zn, Sn, Zr, In, Nb, Mo etc.

Rotatable sputter targets length up to 4000 mm.
Dog-bone & straight targets
High purity, fine crystal grain size, full density. 
ISO9001:2008, ISO14001:2004 Sony Green Partner. 

UVTM runs a very strict quality control(QC) system, including raw materials selection, production control, products inspections, fine packing and delivery.
We have more than 30 countries customers all over the world, and got high recognition from our customers. Such as China South Glass Group,Taiwan Glass Group, Samsung, Foxcoon, BYD, etc. 
Payment: L/C, T/T, Western Union, Paypal, Wechat
Delivery: According to the order
Minimum Order: 1 pcs
Packaging: Wrapped with sponge film inside, wooden case outside.

Contact Us
UV Tech Material Ltd
Website: www.uvtm.com
Vicky  Tel.+86 20 22968888 ext 881, Whatsapp: +86 13249153016.
No.4 of HuaHui Road, Overseas Technology Industry Park, Huashan Town,Huadu District, Guangzhou, China


Price

  • Price Condition : FOB
  • Delivery Port : GUANGZHOU,CHINA

Packaging & Delivery

  • Packing :in wood case
  • Delivery Lead Time : 7 days
  • Minimum Order : 1 PC
  • Supply Ability : 293pcs/month

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